• Patent Title: Thin film transistor and method for fabricating same
  • Application No.: US10693395
    Application Date: 2003-10-24
  • Publication No.: US06797535B2
    Publication Date: 2004-09-28
  • Inventor: Hiroshi Tanabe
  • Applicant: Hiroshi Tanabe
  • Priority: JP11-263635 19990917
  • Main IPC: H01L2100
  • IPC: H01L2100
Thin film transistor and method for fabricating same
Abstract:
In a thin film transistor provided with a metallic layer with a light-shading property and a Si layer formed on an insulating layer, a dent for locally thinning the insulating layer is formed on a portion corresponding to a drain region. When the Si layer is recrystallized by means of a laser light irradiation, the dent serves as a crystalline nucleus formation region in order to recrystallize a particular portion earlier than other portions. Recrystallization of melted Si starts from a periphery of a bottom surface of the dent, hence a Si layer formed of a single crystal or uniformed crystal grains which serves as an active region of the TFT can be obtained.
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