发明授权
- 专利标题： Overlay inspection apparatus for semiconductor substrate and method thereof
- 专利标题（中）： 半导体衬底叠层检查装置及其方法
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申请号： US10268716申请日： 2002-10-09
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公开(公告)号： US06801827B2公开(公告)日： 2004-10-05
- 发明人: Yasuhiro Yoshitake , Shunichi Matsumoto , Toshiharu Miwa
- 申请人： Yasuhiro Yoshitake , Shunichi Matsumoto , Toshiharu Miwa
- 优先权： JP2001-216130 20010717
- 主分类号： G06F1900
- IPC分类号： G06F1900
摘要：
A system for manufacturing a semiconductor device which predicts a difference in registration error between a circuit pattern and an overlay mark from a pattern dimension, illumination conditions and the wave aberration of an exposure lens, feeds a correction value based on the predicted difference back to an exposure device and modifies an overlay inspection data control limit.
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