- 专利标题: Method with trench source to increase the coupling of source to floating gate in split gate flash
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申请号: US10627013申请日: 2003-07-25
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公开(公告)号: US06803625B2公开(公告)日: 2004-10-12
- 发明人: Chia-Ta Hsieh , Di Son Kuo , Chrong-Jun Lin , Wen-Ting Chu
- 申请人: Chia-Ta Hsieh , Di Son Kuo , Chrong-Jun Lin , Wen-Ting Chu
- 主分类号: H01L2978
- IPC分类号: H01L2978
摘要:
A split-gate flash memory cell having improved programming and erasing speed with a tilted trench source, and also a method of forming the same are provided. This is accomplished by forming two floating gates and their respective control gates sharing a common source region. A trench is formed in the source region and the walls are sloped to have a tilt. A source implant is performed at a tilt angle and the trench is lined with a gate oxide layer. Subsequently, a lateral diffusion of the source implant is performed followed by thermal cycling. The lateral enlargement of the diffused source is found to increase the coupling ratio of the split-gate flash memory cell substantially.
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