Invention Grant
- Patent Title: Optical waveguide platform and manufacturing method thereof
- Patent Title (中): 光波导平台及其制造方法
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Application No.: US10292852Application Date: 2002-11-12
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Publication No.: US06804444B2Publication Date: 2004-10-12
- Inventor: Jang-uk Shin , Duk-jun Kim , Sang-ho Park , Young-tak Han , Hee-keyng Sung
- Applicant: Jang-uk Shin , Duk-jun Kim , Sang-ho Park , Young-tak Han , Hee-keyng Sung
- Priority: KR2002-17599 20020330
- Main IPC: G02B642
- IPC: G02B642

Abstract:
An optical waveguide platform and a manufacturing method thereof are provided. In the provided optical waveguide platform, a terrace on which an optical device is mounted is formed by using an etch stopper pattern formed on a lower clad layer. Therefore, the optical device is mounted without processing a silicon substrate. In addition, in the provided optical waveguide platform, the etch stopper pattern is formed on the lower clad layer to prevent defocus in a photolithography process due to an etch step, so as not to damage a fine waveguide pattern. Moreover, an optical waveguide is formed on the terrace in manufacturing the optical waveguide platform to examine the characteristics of the optical waveguide device before etching a trench.
Public/Granted literature
- US20030190108A1 Optical waveguide platform and manufacturing method thereof Public/Granted day:2003-10-09
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