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US06805779B2 Plasma generation using multi-step ionization 失效
使用多步电离的等离子体发生

  • Patent Title: Plasma generation using multi-step ionization
  • Patent Title (中): 使用多步电离的等离子体发生
  • Application No.: US10249202
    Application Date: 2003-03-21
  • Publication No.: US06805779B2
    Publication Date: 2004-10-19
  • Inventor: Roman Chistyakov
  • Applicant: Roman Chistyakov
  • Main IPC: C23C1400
  • IPC: C23C1400
Plasma generation using multi-step ionization
Abstract:
The present invention relates to a plasma generator that generates a plasma with a multi-step ionization process. The plasma generator includes an excited atom source that generates excited atoms from ground state atoms supplied by a feed gas source. A plasma chamber confines a volume of excited atoms generated by the excited atom source. An energy source is coupled to the volume of excited atoms confined by the plasma chamber. The energy source raises an energy of excited atoms in the volume of excited atoms so that at least a portion of the excited atoms in the volume of excited atoms is ionized, thereby generating a plasma with a multi-step ionization process.
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