High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches
    1.
    发明申请
    High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches 审中-公开
    高功率脉冲磁控溅射用于高纵横比特征,通孔和沟槽

    公开(公告)号:US20100270144A1

    公开(公告)日:2010-10-28

    申请号:US12819914

    申请日:2010-06-21

    Inventor: Roman Chistyakov

    Abstract: A plasma source includes a chamber for containing a feed gas. An anode is positioned in the chamber. A segmented magnetron cathode comprising a plurality of electrically isolated magnetron cathode segments is positioned in the chamber proximate to the anode. A power supply is electrically connected to an electrical input of a switch. A respective one of the plurality of electrical outputs of the switch is electrically connected to a respective one of the plurality of magnetron cathode segments. The power supply generates a train of voltage pulses that ignites a plasma from the feed gas. Individual voltage pulses in the train of voltage pulses are routed by the switch in a predetermined sequence to at least two of the plurality of magnetron cathode segments.

    Abstract translation: 等离子体源包括用于容纳进料气体的室。 阳极位于腔室中。 包括多个电隔离的磁控管阴极段的分段磁控管阴极位于靠近阳极的室中。 电源电连接到开关的电输入端。 开关的多个电输出中的相应一个电连接到多个磁控管阴极段中的相应一个。 电源产生一串电压脉冲,其从进料气体点燃等离子体。 电压脉冲串中的单个电压脉冲由开关以预定顺序路由到多个磁控管阴极段中的至少两个。

    METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH IONIZATIONAL INSTABILITIES
    2.
    发明申请
    METHODS AND APPARATUS FOR GENERATING STRONGLY-IONIZED PLASMAS WITH IONIZATIONAL INSTABILITIES 有权
    用于产生具有离子稳定性的强离子化等离子体的方法和装置

    公开(公告)号:US20070188104A1

    公开(公告)日:2007-08-16

    申请号:US11738491

    申请日:2007-04-22

    Abstract: A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply comprising solid state switches that are controlled by micropulses generated by drivers. At least one of a pulse width and a duty cycle of the micropulses is varied so that the power supply generates a multi-step voltage waveform at the output having a low-power stage including a peak voltage and a rise time that is sufficient to generate a plasma from the feed gas and a transient stage including a peak voltage and a rise time that is sufficient to generate a more strongly-ionized plasma.

    Abstract translation: 强离子化等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 脉冲电源的输出电连接在阳极和阴极组件之间。 脉冲电源包括由驱动器产生的微脉冲控制的固态开关。 微脉冲的脉冲宽度和占空比中的至少一个被改变,使得电源在具有包括峰值电压和足够产生的峰值电压和上升时间的低功率级的输出端产生多级电压波形 来自进料气体的等离子体和包括足以产生更强电离等离子体的峰值电压和上升时间的瞬态级。

    High-density plasma source
    3.
    发明申请
    High-density plasma source 有权
    高密度等离子体源

    公开(公告)号:US20070034497A1

    公开(公告)日:2007-02-15

    申请号:US10553893

    申请日:2004-04-07

    Inventor: Roman Chistyakov

    Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.

    Abstract translation: 等离子体源技术领域本发明涉及等离子体源。 等离子体源包括具有内部阴极部分和外部阴极部分的阴极组件。 阳极定位成与外阴极部分相邻以在其间形成间隙。 第一电源产生穿过阳极和外部阴极部分之间的间隙的第一电场。 第一电场将位于间隙中的一定体积的进料气体电离,从而产生初始等离子体。 第二电源产生靠近内部阴极部分的第二电场。 第二电场对初始等离子体进行超电离以产生包含比初始等离子体更高密度的离子的等离子体。

    Methods and apparatus for generating high-density plasma
    4.
    发明授权
    Methods and apparatus for generating high-density plasma 有权
    用于产生高密度等离子体的方法和装置

    公开(公告)号:US06853142B2

    公开(公告)日:2005-02-08

    申请号:US10065629

    申请日:2002-11-04

    Inventor: Roman Chistyakov

    CPC classification number: H01J37/32321 C23C14/3471 C23C14/354 H01J37/34

    Abstract: Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a cathode that is positioned adjacent to the anode to form a gap there between. An ionization source generates a weakly-ionized plasma proximate to the cathode. A power supply produces an electric field in the gap between the anode and the cathode. The electric field generates excited atoms in the weakly-ionized plasma and generates secondary electrons from the cathode. The secondary electrons ionize the excited atoms, thereby creating the strongly-ionized plasma

    Abstract translation: 描述了用于产生强电离等离子体的方法和装置。 根据本发明的用于产生强电离等离子体的装置包括阳极和阴极,阳极和阴极邻近阳极定位,以在其间形成间隙。 电离源产生靠近阴极的弱离子化等离子体。 电源在阳极和阴极之间的间隙中产生电场。 电场在弱离子化等离子体中产生激发原子,并从阴极产生二次电子。 二次电子使激发的原子电离,从而产生强电离等离子体

    High-density plasma source
    5.
    发明授权
    High-density plasma source 有权
    高密度等离子体源

    公开(公告)号:US06806651B1

    公开(公告)日:2004-10-19

    申请号:US10249595

    申请日:2003-04-22

    Inventor: Roman Chistyakov

    Abstract: The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.

    Abstract translation: 等离子体源包括具有内部阴极部分和外部阴极部分的阴极组件。 阳极定位成与外阴极部分相邻以在其间形成间隙。 第一电源产生穿过阳极和外部阴极部分之间的间隙的第一电场。 第一电场将位于间隙中的一定体积的进料气体电离,从而产生初始等离子体。 第二电源产生靠近内部阴极部分的第二电场。 第二电场对初始等离子体进行超电离以产生包含比初始等离子体更高密度的离子的等离子体。

    High Power Pulse Ionized Physical Vapor Deposition
    6.
    发明申请
    High Power Pulse Ionized Physical Vapor Deposition 审中-公开
    大功率脉冲电离物理气相沉积

    公开(公告)号:US20100326815A1

    公开(公告)日:2010-12-30

    申请号:US12879036

    申请日:2010-09-10

    Inventor: Roman Chistyakov

    Abstract: Methods and apparatus for high-deposition sputtering are described. A sputtering source includes an anode and a cathode assembly that is positioned adjacent to the anode. The cathode assembly includes a sputtering target. An ionization source generates a weakly-ionized plasma proximate to the anode and the cathode assembly. A power supply produces an electric field between the anode and the cathode assembly that creates a strongly-ionized plasma from the weakly-ionized plasma. The strongly-ionized plasma includes a first plurality of ions that impact the sputtering target to generate sufficient thermal energy in the sputtering target to cause a sputtering yield of the sputtering target to be non-linearly related to a temperature of the sputtering target.

    Abstract translation: 描述了用于高沉积溅射的方法和装置。 溅射源包括邻近阳极定位的阳极和阴极组件。 阴极组件包括溅射靶。 电离源产生靠近阳极和阴极组件的弱离子化等离子体。 电源在阳极和阴极组件之间产生电场,从而产生来自弱离子化等离子体的强电离等离子体。 强电离等离子体包括冲击溅射靶的第一多个离子,以在溅射靶中产生足够的热能,使得溅射靶的溅射产率与溅射靶的温度非线性相关。

    High density plasma source
    7.
    发明授权
    High density plasma source 有权
    高密度等离子体源

    公开(公告)号:US07750575B2

    公开(公告)日:2010-07-06

    申请号:US12245193

    申请日:2008-10-03

    Inventor: Roman Chistyakov

    Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.

    Abstract translation: 等离子体源技术领域本发明涉及等离子体源。 等离子体源包括具有内部阴极部分和外部阴极部分的阴极组件。 阳极定位成与外阴极部分相邻以在其间形成间隙。 第一电源产生穿过阳极和外部阴极部分之间的间隙的第一电场。 第一电场将位于间隙中的一定体积的进料气体电离,从而产生初始等离子体。 第二电源产生靠近内部阴极部分的第二电场。 第二电场对初始等离子体进行超电离以产生包含比初始等离子体更高密度的离子的等离子体。

    Method of Hard Coating a Blade
    8.
    发明申请
    Method of Hard Coating a Blade 审中-公开
    硬涂层方法

    公开(公告)号:US20090321249A1

    公开(公告)日:2009-12-31

    申请号:US12554670

    申请日:2009-09-04

    Abstract: A sputtering apparatus includes a chamber for containing a feed gas. An anode is positioned inside the chamber. A cathode assembly comprising target material is positioned adjacent to an anode inside the chamber. A magnet is positioned adjacent to cathode assembly. A platen that supports a substrate is positioned adjacent to the cathode assembly. An output of the power supply is electrically connected to the cathode assembly. The power supply generates a plurality of voltage pulse trains comprising at least a first and a second voltage pulse train. The first voltage pulse train generates a first discharge from the feed gas that causes sputtering of a first layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the first voltage pulse train. The second voltage pulse train generates a second discharge from the feed gas that causes sputtering of a second layer of target material having properties that are determined by at least one of a peak amplitude, a rise time, and a duration of pulses in the second voltage pulse train.

    Abstract translation: 溅射装置包括用于容纳进料气体的室。 阳极位于室内。 包括目标材料的阴极组件邻近室内的阳极定位。 磁体定位成与阴极组件相邻。 支撑基板的压板位于与阴极组件相邻的位置。 电源的输出电连接到阴极组件。 电源产生包括至少第一和第二电压脉冲串的多个电压脉冲串。 第一电压脉冲串从进料气体产生第一次放电,该第一次放电导致第一层靶材料的溅射,该第一层靶材料的性质由峰值振幅,上升时间和第一电压中的脉冲持续时间 脉冲列车 第二电压脉冲串从进料气体产生第二次放电,其引起第二层靶材料的溅射,该第二层靶材料的性质由峰值振幅,上升时间和第二电压中的脉冲持续时间中的至少一个确定 脉冲列车

    Methods and apparatus for generating high-density plasma
    9.
    发明授权
    Methods and apparatus for generating high-density plasma 有权
    用于产生高密度等离子体的方法和装置

    公开(公告)号:US07604716B2

    公开(公告)日:2009-10-20

    申请号:US10897257

    申请日:2004-07-22

    Inventor: Roman Chistyakov

    CPC classification number: H01J37/32321 C23C14/3471 C23C14/354 H01J37/34

    Abstract: Methods and apparatus for generating a strongly-ionized plasma are described. An apparatus for generating a strongly-ionized plasma according to the present invention includes an anode and a cathode that is positioned adjacent to the anode to form a gap there between. An ionization source generates a weakly-ionized plasma proximate to the cathode. A power supply produces an electric field in the gap between the anode and the cathode. The electric field generates excited atoms in the weakly-ionized plasma and generates secondary electrons from the cathode. The secondary electrons ionize the excited atoms, thereby creating the strongly-ionized plasma.

    Abstract translation: 描述了用于产生强电离等离子体的方法和装置。 根据本发明的用于产生强电离等离子体的装置包括阳极和阴极,阳极和阴极邻近阳极定位,以在其间形成间隙。 电离源产生靠近阴极的弱离子化等离子体。 电源在阳极和阴极之间的间隙中产生电场。 电场在弱离子化等离子体中产生激发原子,并从阴极产生二次电子。 二次电子使激发的原子电离,从而产生强电离等离子体。

    High-density plasma source
    10.
    发明授权
    High-density plasma source 有权
    高密度等离子体源

    公开(公告)号:US07446479B2

    公开(公告)日:2008-11-04

    申请号:US10553893

    申请日:2004-04-07

    Inventor: Roman Chistyakov

    Abstract: The present invention relates to a plasma source. The plasma source includes a cathode assembly having an inner cathode section and an outer cathode section. An anode is positioned adjacent to the outer cathode section so as to form a gap there between. A first power supply generates a first electric field across the gap between the anode and the outer cathode section. The first electric field ionizes a volume of feed gas that is located in the gap, thereby generating an initial plasma. A second power supply generates a second electric field proximate to the inner cathode section. The second electric field super-ionizes the initial plasma to generate a plasma comprising a higher density of ions than the initial plasma.

    Abstract translation: 等离子体源技术领域本发明涉及等离子体源。 等离子体源包括具有内部阴极部分和外部阴极部分的阴极组件。 阳极定位成与外阴极部分相邻以在其间形成间隙。 第一电源产生穿过阳极和外部阴极部分之间的间隙的第一电场。 第一电场将位于间隙中的一定体积的进料气体电离,从而产生初始等离子体。 第二电源产生靠近内部阴极部分的第二电场。 第二电场对初始等离子体进行超电离以产生包含比初始等离子体更高密度的离子的等离子体。

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