Invention Grant
- Patent Title: Method and apparatus for process control in semiconductor manufacture
- Patent Title (中): 半导体制造中过程控制的方法和装置
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Application No.: US10155236Application Date: 2002-05-28
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Publication No.: US06806971B2Publication Date: 2004-10-19
- Inventor: Moshe Finarov
- Applicant: Moshe Finarov
- Priority: IL144806 20010808
- Main IPC: G01B1108
- IPC: G01B1108

Abstract:
An optical system is presented for use in a measurement system for measuring in patterned structures, which is particularly useful controlling processing of the structure progressing on a production line. The system comprises an illuminator unit producing illuminating light to be directed to the structure to produce returned light, a detector unit comprising an imaging detector and a spectrophotometer detector, and a light directing assembly. The light directing assembly defines first and second optical paths for the light propagation. The optical elements accommodated in the first optical path affect the light to provide a relatively small measuring area of the structure's plane. The second optical path is located outside the first optical path, the light propagation through the second optical path providing a relatively large measuring area, as compared to that of the first optical path.
Public/Granted literature
- US20030030822A1 Method and apparatus for process control in semiconductor manufacture Public/Granted day:2003-02-13
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