公开(公告)号：US09616524B2

公开(公告)日：2017-04-11

申请号：US12999313

申请日：2009-06-18

Applicant: Mikhael Matusovsky ,  Amir Noy ,  Moshe Finarov ,  Giora Dishon

Inventor： Mikhael Matusovsky ,  Amir Noy ,  Moshe Finarov ,  Giora Dishon

IPC: C23C14/28 ,  H05B6/00 ,  B23K26/073 ,  B23K26/00 ,  B41M5/382 ,  C23C14/04 ,  H01L31/0224 ,  H05K3/20 ,  B23K26/082 ,  B23K101/40 ,  H05K3/00 ,  B23K101/34 ,  B23K103/00

CPC classification number: B23K26/0738 ,  B23K26/0006 ,  B23K26/0821 ,  B23K26/352 ,  B23K2101/34 ,  B23K2101/40 ,  B23K2103/56 ,  B41M5/38207 ,  B41M5/38221 ,  B41M2205/02 ,  C23C14/04 ,  C23C14/28 ,  H01L31/022425 ,  H05K3/0097 ,  H05K3/207 ,  H05K2201/0108 ,  H05K2203/107 ,  Y02E10/50 ,  Y10T428/24479 ,  Y10T428/2457

Abstract: A method of depositing a material on a receiving substrate, the method comprising: providing a source substrate having a back surface and a front surface, the back surface carrying at least one piece of coating material; providing a receiving substrate positioned adjacent to the source substrate and facing the coating material; and radiating light towards the front surface of the source substrate, to remove at least one piece of the coating material from the source substrate and deposit said removed at least one piece onto the receiving substrate as a whole.

公开(公告)号：US08652872B2

公开(公告)日：2014-02-18

申请号：US13123532

申请日：2009-10-12

Applicant: Moshe Finarov ,  Mikhael Matusovsky ,  Amir Noy

Inventor： Moshe Finarov ,  Mikhael Matusovsky ,  Amir Noy

IPC: H01L21/00

CPC classification number: H01L31/022425 ,  C23C14/28 ,  H01L31/0682 ,  Y02E10/547

Abstract: A photovoltaic cell, the cell comprising: a silicon substrate of bulk silicon material having front and rear surfaces; an emitter layer on the rear surface of said substrate; elongate channels through the emitter layer; elongate contacts to the bulk of the silicon substrate within at least some of the elongate channels, wherein the contacts are narrower than the channels; and gaps in the emitter between at least some of the elongate contacts and the emitter layer on the sides of the contacts.

Abstract translation: 一种光伏电池，所述电池包括：具有前表面和后表面的体硅材料的硅衬底; 在所述衬底的后表面上的发射极层; 细长通道穿过发射极层; 在至少一些细长通道内的硅衬底本体的细长接触，其中触点比通道窄; 以及发射器中至少一些细长触头和触点侧面上的发射极层之间的间隙。

公开(公告)号：US20120268939A1

公开(公告)日：2012-10-25

申请号：US13533424

申请日：2012-06-26

Applicant: Moshe Finarov ,  Giora Dishon ,  Ehud Tirosh

Inventor： Moshe Finarov ,  Giora Dishon ,  Ehud Tirosh

IPC: H01L21/02 ,  F21V5/04

CPC classification number: B23K26/046 ,  G02B6/13

Abstract: A method of manufacturing a waveguide within a substrate by local modification of material structure under high power density laser radiation applied from the mostly distant side of the substrate.

Abstract translation: 通过从基板的最远侧施加的高功率密度激光辐射下的材料结构的局部修改来在衬底内制造波导的方法。

公开(公告)号：US08023122B2

公开(公告)日：2011-09-20

申请号：US12838763

申请日：2010-07-19

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/24

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US07864343B2

公开(公告)日：2011-01-04

申请号：US12624555

申请日：2009-11-24

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method of preparation of reference data for measuring the profile of a patterned structure for use in control of a manufacturing process, the method including: providing a model for generating profiles based on the manufacturing process; generating the profiles by simulation of the manufacturing process; and preparing diffraction signal reference data corresponding to the generated profiles.

Abstract translation: 一种制备参考数据的方法，用于测量用于控制制造过程的图案化结构的轮廓，所述方法包括：提供用于基于制造过程产生轮廓的模型; 通过模拟制造过程生成轮廓; 并准备对应于所生成的轮廓的衍射信号参考数据。

公开(公告)号：US20100324865A1

公开(公告)日：2010-12-23

申请号：US12853453

申请日：2010-08-10

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G06F19/00 ,  G01B11/24

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US20100204820A1

公开(公告)日：2010-08-12

申请号：US12602770

申请日：2008-06-05

Applicant: Moshe Finarov ,  Beniamin Schulman

Inventor： Moshe Finarov ,  Beniamin Schulman

IPC: H01L21/68

CPC classification number: H01L21/681 ,  H01L21/68728

Abstract: A system for substrate handling proposed, comprising an optical local tilt detector, a plurality of arms each having vertically extended movable along vertical axis fingers to contact the edge of a substrate, wherein at least one of the arms has a linear actuator moveable arm and each of the fingers provided by z-axis miniature linear actuator; and a control unit connected to said tilt detector and said z-axis linear actuators enabling measuring and correcting of local tilt.

Abstract translation: 提出了一种用于基板处理的系统，包括光学局部倾斜检测器，多个臂，每个臂具有垂直延伸，可沿着垂直轴指可移动以接触基板的边缘，其中至少一个臂具有线性致动器可动臂和每个 由z轴微型线性致动器提供的手指; 以及连接到所述倾斜检测器和所述z轴线性致动器的控制单元，其能够测量和校正局部倾斜。

公开(公告)号：US07760368B2

公开(公告)日：2010-07-20

申请号：US11931342

申请日：2007-10-31

Applicant: Moshe Finarov ,  Boaz Brill

Inventor： Moshe Finarov ,  Boaz Brill

IPC: G01B11/14

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/4788 ,  G01N21/55 ,  G03F1/84

Abstract: A method and system are presented for determining a line profile in a patterned structure, aimed at controlling a process of manufacture of the structure. The patterned structure comprises a plurality of different layers, the pattern in the structure being formed by patterned regions and un-patterned regions. At least first and second measurements are carried out, each utilizing illumination of the structure with a broad wavelengths band of incident light directed on the structure at a certain angle of incidence, detection of spectral characteristics of light returned from the structure, and generation of measured data representative thereof. The measured data obtained with the first measurement is analyzed, and at least one parameter of the structure is thereby determined. Then, this determined parameter is utilized, while analyzing the measured data obtained with the second measurements enabling the determination of the profile of the structure.

公开(公告)号：US20080297794A1

公开(公告)日：2008-12-04

申请号：US12188624

申请日：2008-08-08

Applicant: Moshe Finarov

Inventor： Moshe Finarov

IPC: G01J3/42 ,  G01N21/88

CPC classification number: H01L21/6838 ,  B24B37/005 ,  B24B37/013 ,  B24B49/12 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/20

Abstract: A measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.

Abstract translation: 测量系统可安装在处理设备内，更具体地可在抛光机的出口站内。 该系统的光学方案包括分光光度通道，成像通道以及用于保持测量晶片的装置。

公开(公告)号：US20060193630A1

公开(公告)日：2006-08-31

申请号：US11402009

申请日：2006-04-12

Applicant: Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

Inventor： Giora Dishon ,  Moshe Finarov ,  Zvi Nirel ,  Yoel Cohen

IPC: G03D5/00

CPC classification number: G03F7/70058 ,  G01B11/14 ,  G01N21/88 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/8867 ,  G03F7/3028 ,  G03F7/70525 ,  G03F7/70616 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065 ,  G03F7/70675 ,  G03F7/7075 ,  G03F7/70991 ,  H01L21/67155

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.