Preparation of thin silica films with controlled thickness and tunable refractive index

发明授权

US06808742B2 Preparation of thin silica films with controlled thickness and tunable refractive index 失效

标题翻译：制备具有可控厚度和可调折射率的薄二氧化硅薄膜

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专利标题： Preparation of thin silica films with controlled thickness and tunable refractive index
专利标题（中）： 制备具有可控厚度和可调折射率的薄二氧化硅薄膜
申请号： US10384188

申请日： 2003-03-07
公开(公告)号： US06808742B2

公开(公告)日： 2004-10-26
发明人: Jason H. Rouse , Gregory S. Ferguson
申请人： Jason H. Rouse , Gregory S. Ferguson
主分类号： B05D506
IPC分类号： B05D506

$Preparation of thin silica films with controlled thickness and tunable refractive index$

摘要：

A method of forming a porous silica film includes the following steps: a) providing a substrate; b) coating, on a surface of the substrate, a layer of charged polyelectrolyte; and c) applying an aged silica-bearing non-colloidal solution to the coated surface of the substrate to adsorb porous silica thereon. The adsorption cycle of steps (b) and (c) is repeated a number of times to control film thickness. The age and concentration of the silica-bearing solution are selected to control the porosity and the index of refraction of the porous silica film.

摘要（中）：

形成多孔二氧化硅膜的方法包括以下步骤：a）提供基材; b）在基材的表面上涂覆带电的聚电解质层; 以及c）将含老化的含二氧化硅的非胶体溶液施加到所述基材的涂覆表面上以在其上吸附多孔二氧化硅。步骤（b）和（c）的吸附循环重复多次以控制膜厚度。选择含硅溶液的年龄和浓度来控制多孔二氧化硅膜的孔隙率和折射率。

公开/授权文献

US20030228420A1 Preparation of thin silica films with controlled thickness and tunable refractive index 公开/授权日：2003-12-11

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