发明授权
- 专利标题： System and method for detecting defects on a structure-bearing surface using optical inspection
- 专利标题（中）： 使用光学检查检测结构轴承表面缺陷的系统和方法
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申请号： US09697807申请日： 2000-10-27
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公开(公告)号： US06813376B1公开(公告)日： 2004-11-02
- 发明人: Kathleen Hennessey , Youling Lin , Yongqiang Liu , Veera V. S. Khaja , Yonghang Fu
- 申请人： Kathleen Hennessey , Youling Lin , Yongqiang Liu , Veera V. S. Khaja , Yonghang Fu
- 主分类号： G06K900
- IPC分类号： G06K900
摘要：
A method of collating and using captured semiconductor-wafer image data in an automated defect analysis. The method includes the steps of receiving image data and, if necessary, converting it to a digital format. Once the data is in pixel-by-pixel form, each pixel is assigned a slope value derived from the direction of the structure edge, if any, on which it lies. The pixel-slope data is then evaluated to determine whether a photo-resist anomaly is present. The method may also include evaluated an average pixel slope value for each inspected wafer. Dependant claims further define the invention to claim an inspection system for employing the method.
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