Invention Grant
- Patent Title: Ion sources for ion implantation apparatus
- Patent Title (中): 离子注入装置的离子源
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Application No.: US10703165Application Date: 2003-11-07
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Publication No.: US06818909B2Publication Date: 2004-11-16
- Inventor: Adrian Murrell , Peter Michael Banks , Andrew Allen , Neil L. Clarke , Matthew Peter Dobson
- Applicant: Adrian Murrell , Peter Michael Banks , Andrew Allen , Neil L. Clarke , Matthew Peter Dobson
- Priority: GB0128913 20011203
- Main IPC: H01J4910
- IPC: H01J4910
Abstract:
The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
Public/Granted literature
- US20040144932A1 Ion sources for ion implantation apparatus Public/Granted day:2004-07-29
Information query
