发明授权
US06821616B1 Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film
失效
用于FPDS的保护性薄膜，使用所述薄膜制造所述薄膜和FPDS的方法
- 专利标题： Protective thin film for FPDS, method for producing said thin film and FPDS using said thin film
- 专利标题（中）： 用于FPDS的保护性薄膜，使用所述薄膜制造所述薄膜和FPDS的方法
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申请号： US09457743申请日： 1999-12-10
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公开(公告)号： US06821616B1公开(公告)日： 2004-11-23
- 发明人: Hideaki Sakurai , Yukiya Yamashita , Yoshirou Kuromitsu
- 申请人： Hideaki Sakurai , Yukiya Yamashita , Yoshirou Kuromitsu
- 优先权： JP10-351167 19981210; JP11-139766 19990520; JP11-136599 19990518; JP11-182814 19990629
- 主分类号： B32B904
- IPC分类号： B32B904
摘要：
The present invention provides a protecting film capable of preventing deterioration in adhesion and matching to a substrate (dielectric layer), and deterioration in electric insulation. The protecting film includes a film body composed of MgO or the like which is inhibited from reacting with CO2 gas and H2O gas in air to prevent degeneration of MgO or the like into MgCO3 and Mg(OH)2, etc. harmful to FPD. The film body is formed on the surface of the substrate, and the fluoride layer is formed on the surface of the film body. The fluoride layer is represented by MOXFY (M is Mg, Ca, Sr, Ba, an alkali earth complex metal, a rare earth metal, or a complex metal of an alkali earth metal and a rare earth metal, 0≦X
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