Method of chemically altering a silicon surface and associated electrical devices

Invention Grant

US06822308B2 Method of chemically altering a silicon surface and associated electrical devices 失效

Title translation: 化学改变硅表面和相关电器件的方法

Patent Title: Method of chemically altering a silicon surface and associated electrical devices
Patent Title (中): 化学改变硅表面和相关电器件的方法
Application No.: US10600665

Application Date: 2003-06-20
Publication No.: US06822308B2

Publication Date: 2004-11-23
Inventor: Sheldon Aronowitz , Vladimir Zubkov
Applicant: Sheldon Aronowitz , Vladimir Zubkov
Main IPC: H01L2900
IPC: H01L2900

Abstract:

A method of chemically altering a silicon surface and associated dielectric materials are disclosed.

Abstract(Chinese):

公开了一种化学改变硅表面和相关介电材料的方法。

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