发明授权
- 专利标题: Method and apparatus for the determination of layer thicknesses
- 专利标题(中): 用于确定层厚度的方法和装置
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申请号: US10360965申请日: 2003-02-07
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公开(公告)号: US06826511B2公开(公告)日: 2004-11-30
- 发明人: Hakon Mikkelsen , Horst Engel , Joachim Wienecke
- 申请人: Hakon Mikkelsen , Horst Engel , Joachim Wienecke
- 优先权: DE10204943 20020207
- 主分类号: G06F1500
- IPC分类号: G06F1500
摘要:
A method and apparatus for determination of layer thicknesses and optical parameters of a number of layers of a specimen, in which the reflectance spectrum of the specimen is measured and then smoothed, and a modeled reflectance spectrum is adapted to the measured one by means of an optimization criterion so as thereby to determine the layer thickness. The optimization criterion is determined by the totality of the absolute values of the wavelength differences of all pairs of wavelengths, a pair of wavelengths being constituted by those wavelengths that respectively correspond to a selected extreme in the measured reflectance spectrum characterized by an index counting the extremes in ascending or descending order, and a selected extreme in the modeled reflectance spectrum having the same index.
公开/授权文献
- US20030147085A1 Method for the determination of layer thicknesses 公开/授权日:2003-08-07
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