发明授权
US06828650B2 Bipolar junction transistor structure with improved current gain characteristics
有权
具有改善的电流增益特性的双极结晶体管结构
- 专利标题: Bipolar junction transistor structure with improved current gain characteristics
- 专利标题(中): 具有改善的电流增益特性的双极结晶体管结构
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申请号: US10160940申请日: 2002-05-31
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公开(公告)号: US06828650B2公开(公告)日: 2004-12-07
- 发明人: Edouard de Frésart , Patrice Parris , Richard J De Souza , Jennifer H. Morrison , Moaniss Zitouni , Xin Lin
- 申请人: Edouard de Frésart , Patrice Parris , Richard J De Souza , Jennifer H. Morrison , Moaniss Zitouni , Xin Lin
- 主分类号: H01L2900
- IPC分类号: H01L2900
摘要:
A Bipolar Junction Transistor (BJT) that reduces the variation in the current gain through the use of a trench pullback structure. The trench pullback structure is comprised of a trench and an active region. The trench reduces recombination in the emitter-base region through increasing the distance charge carriers must travel between the emitter and the base. The trench also reduces recombination by reducing the amount of interfacial traps that the electrons injected from the emitter are exposed to. Further, the trench is pulled back from the emitter allowing an active region where electrons injected from a sidewall of the emitter can contribute to the overall injected emitter current. This structure offers the same current capability and current gain as a device without the trench between the emitter and the base while reducing the current gain variation.
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