发明授权
US06833587B1 Heat removal in SOI devices using a buried oxide layer/conductive layer combination 有权
使用掩埋氧化物层/导电层组合的SOI器件中的热去除

  • 专利标题: Heat removal in SOI devices using a buried oxide layer/conductive layer combination
  • 专利标题(中): 使用掩埋氧化物层/导电层组合的SOI器件中的热去除
  • 申请号: US10174328
    申请日: 2002-06-18
  • 公开(公告)号: US06833587B1
    公开(公告)日: 2004-12-21
  • 发明人: Ming-Ren Lin
  • 申请人: Ming-Ren Lin
  • 主分类号: H01L2701
  • IPC分类号: H01L2701
Heat removal in SOI devices using a buried oxide layer/conductive layer combination
摘要:
A silicon-on-insulator substrate is disclosed which comprises: a silicon substrate layer; a first insulation layer over the silicon substrate layer; a conductive layer over the first insulation layer comprising at least one metal or metal silicide over the first insulation layer; a second insulation layer over the conductive layer; a silicon device layer comprising silicon over the second insulation layer; and at least one conductive plug through the silicon substrate layer and the first insulation layer contacting the conductive layer, or at least one conductive plug through the silicon device layer and the second insulation layer contacting the conductive layer. Also disclosed are methods for making silicon-on-insulator substrates having improved heat transfer structures.
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