发明授权
US06835524B2 Polymers, chemical amplification resist compositions and patterning process 有权
聚合物,化学放大抗蚀剂组合物和图案化工艺

  • 专利标题: Polymers, chemical amplification resist compositions and patterning process
  • 专利标题(中): 聚合物,化学放大抗蚀剂组合物和图案化工艺
  • 申请号: US09783321
    申请日: 2001-02-15
  • 公开(公告)号: US06835524B2
    公开(公告)日: 2004-12-28
  • 发明人: Jun HatakeyamaJun WatanabeYuji Harada
  • 申请人: Jun HatakeyamaJun WatanabeYuji Harada
  • 优先权: JP2000-037396 20000216
  • 主分类号: G03C173
  • IPC分类号: G03C173
Polymers, chemical amplification resist compositions and patterning process
摘要:
Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is a hydrophilic group. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.
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