发明授权
US06844398B2 Ethylenic copolymer, composition containing said copolymer, and ethylenic copolymer film
失效
乙烯共聚物，含有所述共聚物的组合物和乙烯类共聚物膜
- 专利标题： Ethylenic copolymer, composition containing said copolymer, and ethylenic copolymer film
- 专利标题（中）： 乙烯共聚物，含有所述共聚物的组合物和乙烯类共聚物膜
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申请号： US10153891申请日： 2002-05-24
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公开(公告)号： US06844398B2公开(公告)日： 2005-01-18
- 发明人: Haruo Shikuma , Shuji Machida , Motoharu Ishikawa , Shinichi Kurokawa
- 申请人： Haruo Shikuma , Shuji Machida , Motoharu Ishikawa , Shinichi Kurokawa
- 申请人地址： JP
- 专利权人： Idemitsu Kosan Co., Ltd.
- 当前专利权人： Idemitsu Kosan Co., Ltd.
- 当前专利权人地址： JP
- 代理机构： Parkhurst & Wendel, L.L.P.
- 主分类号： C08F210/16
- IPC分类号： C08F210/16 ; C08J5/18 ; C08L23/08 ; C08F23/08 ; C08F23/16
摘要：
An ethylenic copolymer composition including an ethylenic copolymer having Mw/Mn of 1.5 to 4, Mw of 3,000 to 1,000,000, and a resin density of 0.85 to 0.95 g/cm3. The relationship between the half width at the half maximum [W/2] of the Gaussian distribution curve, and the average, n, of short-chain branches in the copolymer satisfies the equation, 0.704+0.147n=W/2=−0.055+0.577n. The ethylenic copolymer composition also includes an ethylenic copolymer having an Mw of 3,000 to 1,000,000 and a resin density of 0.85 to 0.95 g/cm3.