发明授权
- 专利标题: Electron beam length-measurement apparatus and measurement method
- 专利标题(中): 电子束长度测量装置及测量方法
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申请号: US10274328申请日: 2002-10-18
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公开(公告)号: US06844549B2公开(公告)日: 2005-01-18
- 发明人: Jun Matsumoto , Takayuki Nakamura
- 申请人: Jun Matsumoto , Takayuki Nakamura
- 申请人地址: JP Tokyo
- 专利权人: Advantest Corporation
- 当前专利权人: Advantest Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Morrison & Foerster LLP
- 优先权: JP2000-123921 20000425
- 主分类号: G01B15/00
- IPC分类号: G01B15/00 ; G01Q10/00 ; G01Q30/02 ; H01J37/147 ; H01J37/21 ; H01J37/28 ; H01J37/244
摘要:
An electron beam length-measurement apparatus for measuring a length of a predetermined portion of an object by using an electron beam, includes: an electron gun for emitting the electron beam; a deflecting unit for deflecting the electron beam; an object holding unit on which the object is to be placed; a detector for detecting electrons that are scattered by the electron beam; a memory for storing layout position information that specifies a layout position at which the predetermined portion of the object; a length-measurement scanning controller for controlling the deflecting unit to scan with the electron beam to allow the layout position on the object to be irradiated with the electron beam; and a measurement unit operable to measure the length of the predetermined portion of the object based on a changing manner of the electrons successively detected by the detector while the length-measurement scanning controller scans with the electron beam.
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