Invention Grant
- Patent Title: Positive-working lithographic printing plate precursors
- Patent Title (中): 正性平版印刷版前体
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Application No.: US10116948Application Date: 2002-04-05
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Publication No.: US06846613B2Publication Date: 2005-01-25
- Inventor: Joan Vermeersch , Marc Van Damme
- Applicant: Joan Vermeersch , Marc Van Damme
- Applicant Address: BE Mortsel
- Assignee: AGFA-Gevaert
- Current Assignee: AGFA-Gevaert
- Current Assignee Address: BE Mortsel
- Agency: Leydig, Voit&Mayer Ltd.
- Priority: EP01000109 20010409
- Main IPC: B41C1/10
- IPC: B41C1/10 ; B41M5/36 ; B41N1/14 ; G03F7/075 ; G03F7/11 ; G03F7/30

Abstract:
A positive-working printing plate precursor for wet lithographic printing is disclosed which comprises a support having a hydrophilic surface and a coating comprising a first layer closest to the support, said first layer containing an oleophilic phenolic resin soluble in an aqueous alkaline developer, and a second layer containing an amphyphilic polymer, wherein(a) the second layer is capable of preventing the aqueous alkaline developer from penetrating into the first layer to an extent that substantially no dissolution of unexposed coating occurs upon immersion in the aqueous alkaline developer during a time period t2;(b) and wherein said capability of the second layer of preventing the aqueous alkaline developer from penetrating into the first layer is reduced upon exposure to heat or light to an extent that substantially complete dissolution of exposed coating occurs upon immersion in the aqueous alkaline developer during a time period t1;wherein t2>t1 and t2−t1 is at least 10 seconds; and wherein the amphyphilic polymer is a block- or graft-copolymer comprising (i) a poly(alkylene oxide) block and (ii) a block comprising siloxane and/or perfluorohydrocarbon units.
Public/Granted literature
- US20020146644A1 Positive-working lithographic printing plate precursors Public/Granted day:2002-10-10
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