发明授权
- 专利标题: Electron source substrate, production method thereof, and image forming apparatus using electron source substrate
- 专利标题(中): 电子源基板及其制造方法以及使用电子源基板的成像装置
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申请号: US10227206申请日: 2002-08-26
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公开(公告)号: US06853128B2公开(公告)日: 2005-02-08
- 发明人: Takahiro Hachisu
- 申请人: Takahiro Hachisu
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2001257176 20010828
- 主分类号: H01J9/02
- IPC分类号: H01J9/02 ; H01J1/316 ; H01J29/04 ; H01J29/92 ; H01J31/12 ; H01J1/62
摘要:
An electron source substrate has an electron-emitting device consisting of a pair of device electrodes and an electroconductive thin film having an electron-emitting region; and metal wiring coupled to the device electrodes and made in a composition different from that of the device electrodes, on a substrate. A shortest distance between the conductive thin film and the metal wiring along an interface between the device electrodes and the substrate is not less than 50 μm. This configuration is able to effectively prevent diffusion of the wiring metal to the conductive thin film and to the electron-emitting region which can cause degradation of electron emission characteristics.
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