发明授权
- 专利标题: Film for optical applications
- 专利标题(中): 光学应用薄膜
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申请号: US10085570申请日: 2002-02-27
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公开(公告)号: US06859322B2公开(公告)日: 2005-02-22
- 发明人: Satoru Shoshi , Yutaka Onozawa , Shigenobu Maruoka
- 申请人: Satoru Shoshi , Yutaka Onozawa , Shigenobu Maruoka
- 申请人地址: JP Tokyo
- 专利权人: Lintec Corporation
- 当前专利权人: Lintec Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Frishauf, Holtz, Goodman & Chick, P.C.
- 优先权: JP2001-093131 20010328
- 主分类号: G02B1/10
- IPC分类号: G02B1/10 ; B32B7/02 ; B32B27/00 ; G02B1/11 ; G02B1/111 ; G02B1/14 ; G02B1/16 ; G02B1/18
摘要:
A film for optical applications comprising (A) a hard coat layer which comprises a resin cured by an ionizing radiation, (B) a high refractivity layer I which comprises a resin cured by an ionizing radiation and a metal oxide and has a refractive index in a range of 1.70 to 1.95, (C) a high refractivity layer II which comprises a resin cured by an ionizing radiation and a metal oxide and has a refractive index in a range of 1.60 to 1.70 and (D) a low refractivity layer which comprises a siloxane-based polymer and has a refractive index in a range of 1.37 to 1.47, layers (A) to (D) having specific thicknesses and being successively laminated at least on one face of a substrate film. The film exhibits an excellent property for preventing reflection of light and excellent scratch resistance and can be produced at a low cost.
公开/授权文献
- US20020176169A1 Film for optical applications 公开/授权日:2002-11-28