发明授权
- 专利标题: Pressure sensor and manufacturing method thereof
- 专利标题(中): 压力传感器及其制造方法
-
申请号: US10047627申请日: 2002-01-14
-
公开(公告)号: US06860154B2公开(公告)日: 2005-03-01
- 发明人: Satoshi Yamamoto , Osamu Nakao , Hitoshi Nishimura , Masahiro Sato
- 申请人: Satoshi Yamamoto , Osamu Nakao , Hitoshi Nishimura , Masahiro Sato
- 申请人地址: JP Tokyo
- 专利权人: Fujikura Ltd.
- 当前专利权人: Fujikura Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Bell, Boyd & Lloyd LLC
- 优先权: JPP2001-007756 20010116; JPP2001-030783 20010207
- 主分类号: G01L1/14
- IPC分类号: G01L1/14 ; G01L9/00 ; G01L9/12 ; G01L7/08 ; G01L9/16
摘要:
It is an object of the present invention to provide a touch mode capacitive pressure sensor having higher pressure durability than conventional sensors. In this invention, a touch mode capacitive pressure sensor has a diaphragm made from boron-doped silicon, and the boron concentration at the top face of the diaphragm is equal to or greater than 1×1019 cm−3 and less than 9×1019 cm−3. Further, in this invention, a touch mode capacitive pressure sensor has a conductive diaphragm made by doping of an impurity and anisotropic etching, and the etch pit density on the top face of the diaphragm is equal to or less than five per μm2, and preferably equal to or less than one per μm2. As a result, the pressure durability of the diaphragm is greatly improved.
公开/授权文献
- US20020092356A1 Pressure sensor and manufacturing method thereof 公开/授权日:2002-07-18
信息查询