发明授权
- 专利标题: Photoelectric cell and process for producing metal oxide semiconductor film for use in photoelectric cell
- 专利标题(中): 光电池用光电池用金属氧化物半导体膜的制造方法
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申请号: US10361079申请日: 2003-02-06
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公开(公告)号: US06864415B2公开(公告)日: 2005-03-08
- 发明人: Tsuguo Koyanagi , Michio Komatsu , Hirokazu Tanaka , Katsuhiro Shirono
- 申请人: Tsuguo Koyanagi , Michio Komatsu , Hirokazu Tanaka , Katsuhiro Shirono
- 申请人地址: JP Kanagawa
- 专利权人: Catalysts & Chemicals Industries Co., Ltd.
- 当前专利权人: Catalysts & Chemicals Industries Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Webb Ziesenheim Logsdon Orkin & Hanson, P.C.
- 优先权: JP10-149550 19980529; JP10-245935 19980831
- 主分类号: C09C1/30
- IPC分类号: C09C1/30 ; H01G9/20 ; H01L31/04 ; C01G23/053 ; C09D1/00 ; H01M14/00
摘要:
A photoelectric cell that includes a first insulating base, having on its surface a first electrode layer, which has on its surface a metal oxide semiconductor film, which includes anatase titanium oxide particles, on which a photosensitizer is absorbed and a second insulating base having on its surface a second electrode layer and an electrolyte sealed between the metal oxide semiconductor film and the second electrode layer. The first electrode layer and the second electrode layer are arranged opposite from each other. At least one of the first and second insulating bases with an electrode layer is transparent.
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