Invention Grant
- Patent Title: Ion sources
- Patent Title (中): 离子源
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Application No.: US10221545Application Date: 2002-02-11
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Publication No.: US06864486B2Publication Date: 2005-03-08
- Inventor: Valery V. Alekseev , Vsevolod V. Zelenkov , Mark M. Krivoruchko , John E. Keem
- Applicant: Valery V. Alekseev , Vsevolod V. Zelenkov , Mark M. Krivoruchko , John E. Keem
- Applicant Address: US NY Woodbury
- Assignee: Veeco Instruments, Inc.
- Current Assignee: Veeco Instruments, Inc.
- Current Assignee Address: US NY Woodbury
- Priority: RU2001112999 20010516
- International Application: PCTRU02/00041 WO 20020211
- International Announcement: WO0209398 WO 20021121
- Main IPC: H05H1/54
- IPC: H05H1/54 ; F03H1/00 ; H01J27/02 ; H01J27/18 ; H05H1/92 ; H01J17/04 ; H01J27/00 ; H01L21/306

Abstract:
A closed loop exit hole is formed in a magnetically permeable end wall (2) of an enclosure (1) of a closed electron drift ion source. Parts of this end wall separated by the exit hole serve as pole pieces (7 and 8) of the magnetic system and define the first pole gap. The magnetic system includes pole pieces (9 and 10), which define the second pole gap made in the form of a closed loop exit hole and arranged along the direction of ion emission. Magnetomotive force sources (5 and 6) are located in space between two groups of magnetic terminals. The ratio of width of each pole gap and distance between pole pieces of the first (7 and 8) and second (9 and 10) magnetic gaps along the direction of ion emission is not less than 0.05.The invention allows the intensity of the generated ion beam and the energy of ions to be increased, and this is provided by the homogeneous distribution of ion current density across the ion beam section.
Public/Granted literature
- US20040195521A1 Ion sorces Public/Granted day:2004-10-07
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