发明授权
- 专利标题： Stage apparatus, exposure apparatus and method for exposing substrate plate
- 专利标题（中）： 舞台装置，曝光装置和曝光基板的方法
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申请号： US10361495申请日： 2003-02-11
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公开(公告)号： US06864955B2公开(公告)日： 2005-03-08
- 发明人: Kenji Nishi , Toru Kiuchi
- 申请人： Kenji Nishi , Toru Kiuchi
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Westerman, Hattori, Daniels & Adrian, LLP
- 优先权： JP9-71466 19970325
- 主分类号： B23Q1/00
- IPC分类号： B23Q1/00 ; B23Q1/26 ; B23Q1/62 ; G03F7/20 ; H01L21/027 ; H01L21/68 ; H01L21/683 ; G03B27/42 ; G03B27/60 ; G03B27/64
摘要：
The stage apparatus has a movable stage structure body which holds a substrate plate to be processed and is movable on a base structure body. This stage apparatus comprises a receipt edge orifice disposed at least at a portion of a fluid path which is disposed at said stage structure body; and a feed edge orifice being detachably engageable with said receipt edge orifice at a predetermined position on a base structure body and providing or discharging a predetermined fluid to the receipt edge orifice during said engagement of said feed edge orifice with said receipt edge orifice.
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