- 专利标题： Apparatus and method to improve the resolution of photolithography systems by improving the temperature stability of the reticle
-
申请号： US10265856申请日： 2002-10-07
-
公开(公告)号： US06866970B2公开(公告)日： 2005-03-15
- 发明人: Michael Jay Berman , George Edward Bailey
- 申请人： Michael Jay Berman , George Edward Bailey
- 申请人地址： US CA Milpitas
- 专利权人： LSI Logic Corporation
- 当前专利权人： LSI Logic Corporation
- 当前专利权人地址： US CA Milpitas
- 代理机构： Trexler, Bushnell, Giangiorgi & Blackstone, Ltd.
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F7/20 ; G03F9/00
摘要：
A mask for use in a photolithographic process. The mask includes a plate or substrate having first and second opposite surfaces, a first image on the first surface of the substrate and a second image on the second surface of the substrate. When the mask is used in a photolithographic process, energy is reflected by the first image prior to entering the substrate and energy is reflected by the second image after passing through the substrate.
公开/授权文献
信息查询
