发明授权
US06867534B2 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same
失效
具有六个微小自由度的低质量和紧凑的平台装置,以及包括它们的微光刻系统
- 专利标题: Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same
- 专利标题(中): 具有六个微小自由度的低质量和紧凑的平台装置,以及包括它们的微光刻系统
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申请号: US10159411申请日: 2002-05-29
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公开(公告)号: US06867534B2公开(公告)日: 2005-03-15
- 发明人: Keiichi Tanaka
- 申请人: Keiichi Tanaka
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Klarquist Sparkman, LLP
- 优先权: JP2001-162611 20010530
- 主分类号: G12B5/00
- IPC分类号: G12B5/00 ; G03F7/20 ; H01L21/027 ; H01L21/68 ; H02N2/00 ; H01H41/08
摘要:
Low-mass and compact stage devices are disclosed that exhibit, compared to conventional stage devices, reduced magnetic field fluctuations. An embodiment of such a stage device includes an X-Y coarse-movement stage portion that is drivable in the X-Y directions using respective air cylinders. A fine-movement stage portion is mounted on the X-Y coarse-movement stage portion. The fine-movement stage portion is drivable in any of the six degrees of freedom of motion (i.e., X, Y, Z, θX, θY, and θZ motions) relative to the coarse-movement stage portion. Such fine movements are achieved using six piezo actuators. In a stage device configured for use in a microlithography apparatus, a wafer table or reticle table can be mounted on the fine-movement table.
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