发明授权
US06867534B2 Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same 失效
具有六个微小自由度的低质量和紧凑的平台装置,以及包括它们的微光刻系统

Low-mass and compact stage devices exhibiting six degrees of freedom of fine motion, and microlithography systems comprising same
摘要:
Low-mass and compact stage devices are disclosed that exhibit, compared to conventional stage devices, reduced magnetic field fluctuations. An embodiment of such a stage device includes an X-Y coarse-movement stage portion that is drivable in the X-Y directions using respective air cylinders. A fine-movement stage portion is mounted on the X-Y coarse-movement stage portion. The fine-movement stage portion is drivable in any of the six degrees of freedom of motion (i.e., X, Y, Z, θX, θY, and θZ motions) relative to the coarse-movement stage portion. Such fine movements are achieved using six piezo actuators. In a stage device configured for use in a microlithography apparatus, a wafer table or reticle table can be mounted on the fine-movement table.
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