Invention Grant
- Patent Title: High frequency filter
- Patent Title (中): 高频滤波器
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Application No.: US10252105Application Date: 2002-09-23
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Publication No.: US06870446B2Publication Date: 2005-03-22
- Inventor: Ryoichi Ohara , Kazuhide Abe , Takashi Kawakubo , Hiroshi Yoshida , Hiroshi Tsurumi , Ryuichi Fujimoto
- Applicant: Ryoichi Ohara , Kazuhide Abe , Takashi Kawakubo , Hiroshi Yoshida , Hiroshi Tsurumi , Ryuichi Fujimoto
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Priority: JPP2001-288764 20010921; JPP2002-097050 20020329; JPP2002-097398 20020329
- Main IPC: H03H9/00
- IPC: H03H9/00 ; H03H9/54 ; H03H9/58 ; H03H9/60

Abstract:
A high frequency filter comprises thin film piezoelectric resonators connected in series between the input/output nodes, thin film piezoelectric resonators connected in parallel between the input/output nodes and a variable voltage circuit adapted to change the voltage applied to at least either the thin film piezoelectric resonators connected in series or the thin film piezoelectric resonators connected in parallel. The resonance characteristic of at least either the thin film piezoelectric resonators connected in series or the thin film piezoelectric resonator connected in parallel is shifted by changing the voltage applied by the variable voltage circuit to change the pass characteristic of the filter.
Public/Granted literature
- US20030067368A1 High frequency filter Public/Granted day:2003-04-10
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