Invention Grant
- Patent Title: Structure of a structure release and a method for manufacturing the same
- Patent Title (中): 结构释放的结构及其制造方法
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Application No.: US10725585Application Date: 2003-12-03
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Publication No.: US06870654B2Publication Date: 2005-03-22
- Inventor: Wen-Jian Lin , Hsiung-Kuang Tsai
- Applicant: Wen-Jian Lin , Hsiung-Kuang Tsai
- Applicant Address: TW
- Assignee: Prime View International Co., Ltd.
- Current Assignee: Prime View International Co., Ltd.
- Current Assignee Address: TW
- Agency: Baker & Hostetler LLP
- Priority: TW92114190A 20030526
- Main IPC: G02B26/02
- IPC: G02B26/02 ; B81B3/00 ; B81C1/00 ; G02B26/00 ; G02F1/03 ; H01L21/8242

Abstract:
A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.
Public/Granted literature
- US20040240027A1 Structure of a structure release and a method for manufacturing the same Public/Granted day:2004-12-02
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