发明授权
- 专利标题: Coin provided with diffraction structures
- 专利标题(中): 硬币提供衍射结构
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申请号: US09936935申请日: 2001-01-18
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公开(公告)号: US06871788B2公开(公告)日: 2005-03-29
- 发明人: Wayne Robert Tompkin , René Staub , Andreas Hasler , Jakob Jütz , Martin Müller
- 申请人: Wayne Robert Tompkin , René Staub , Andreas Hasler , Jakob Jütz , Martin Müller
- 申请人地址: CH Zug
- 专利权人: OVD Kinegram AG
- 当前专利权人: OVD Kinegram AG
- 当前专利权人地址: CH Zug
- 代理机构: Hoffmann & Baron, LLP
- 优先权: DE10002644 20000121
- 国际申请: PCTEP01/00517 WO 20010118
- 国际公布: WO0152685 WO 20010726
- 主分类号: A44C21/00
- IPC分类号: A44C21/00 ; G06K19/00
摘要:
A coin (1) with a metal surface (2, 3) has macroscopic reliefs (5) which serve for visually specifying the value of the coin and as an authenticity feature. Microscopically fine relief structures (8) with a diffraction effect are formed directly in at least one of the surfaces (2, 3). The relief structures (8) are preferably arranged in a recessed relationship and are covered with a lacquer (9). It is also advantageous if at least a part of the relief structures (8) entails an asymmetrical profile shape and/or the grating vectors in a radial orientation. The release structures (8) may also include a machine-readable coding which is recognized by inexpensive optical reading devices for installation in coin testers.The application of the microscopic relief structure (8) to a hard material surface (2, 3) can be effected by the removal of material by means of exposure of the material surface (2, 3) with a laser beam. In that operation the laser beam passes through a mask for determining the form of the relief structures (8) and then an optical image-forming system for reduction purposes. The exposure procedure can also be implemented in accordance with the dual beam interference method. In a further method the microscopic relief structures (8) are etched into the material surface (2, 3).
公开/授权文献
- US20020154290A1 Coin provided with diffraction structures 公开/授权日:2002-10-24
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