发明授权
- 专利标题： Wafer container
- 专利标题（中）： 晶圆容器
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申请号： US10669003申请日： 2003-09-24
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公开(公告)号： US06883539B2公开(公告)日： 2005-04-26
- 发明人: Kiyotaka Inoue , Terumi Muguruma , Yuichi Kuroda , Noriaki Yoshikawa
- 申请人： Kiyotaka Inoue , Terumi Muguruma , Yuichi Kuroda , Noriaki Yoshikawa
- 申请人地址： JP Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Kawasaki
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP11-186768 19990630
- 主分类号： H01L21/673
- IPC分类号： H01L21/673 ; H01L21/677 ; H01L21/68 ; B65G1/133
摘要：
A container for storing substrates capable of shortening the cycle time of the production, improving the production efficiency and reducing the production cost is provided. The container for storing substrates is composed of a box for accommodating the substrates, and a closure member for sealingly closing the box by tightly fixing the closure member to the opening of the box. The container for storing substrates is provided with means for temporarily storing a sealing gas and introducing the sealing gas into the box. Also, the container for storing substrates is provided with means for means for temporarily forming a low pressure space for the purpose of evacuating the gas inside of the box by transferring the gas to the low pressure space.
公开/授权文献
- US20040055650A1 Wafer container 公开/授权日：2004-03-25
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