发明授权
- 专利标题: Hydrogen-dissolved water production apparatus
- 专利标题(中): 氢解水生产设备
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申请号: US10329899申请日: 2002-12-26
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公开(公告)号: US06884344B2公开(公告)日: 2005-04-26
- 发明人: Yukinari Yamashita , Takashi Futatsuki
- 申请人: Yukinari Yamashita , Takashi Futatsuki
- 申请人地址: JP Tokyo
- 专利权人: Organo Corporation
- 当前专利权人: Organo Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Osha & May L.L.P.
- 优先权: JP2002-005879 20020115
- 主分类号: B08B3/08
- IPC分类号: B08B3/08 ; B01D19/00 ; B01D61/08 ; B01D61/18 ; C01B3/00 ; C02F1/20 ; C02F1/28 ; C02F1/32 ; C02F1/42 ; C02F1/44 ; C02F1/52 ; C02F1/66 ; C02F1/68 ; C02F1/70 ; C02F1/72 ; C02F9/00 ; H01L21/304
摘要:
A degassing device (10), a hydrogen dissolving device (12), and a palladium catalyst column (17) are provided in that order downstream of a high-purity water production device (1), and an impurity removal device (19) is connected to the exit side of treated water of the palladium catalyst column (17). The impurity removal device (19) removes impurity ions which are eluted into the water to be treated or impurity particulates which mix in with the water to be treated during the treatment in the palladium catalyst column (17). The impurity removal device (19) comprises an ion exchange device (20) and a membrane treatment device (21) such as a ultrafiltration membrane device, a reverse osmosis membrane device or the like. By providing an impurity removal device (19) in this manner, it is possible to remove impurities generated during hydrogen peroxide removal treatment by the palladium catalyst and to prevent degradation in quality of hydrogen-dissolved water.
公开/授权文献
- US20030132104A1 Hydrogen-dissolved water production apparatus 公开/授权日:2003-07-17
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