发明授权
- 专利标题: Measuring apparatus
- 专利标题(中): 测量装置
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申请号: US10108258申请日: 2002-03-28
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公开(公告)号: US06885454B2公开(公告)日: 2005-04-26
- 发明人: Masayuki Naya , Nobufumi Mori , Toshihito Kimura , Hitoshi Shimizu , Shu Sato
- 申请人: Masayuki Naya , Nobufumi Mori , Toshihito Kimura , Hitoshi Shimizu , Shu Sato
- 申请人地址: JP Kanagawa-ken
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa-ken
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2001-093085 20010328; JP2002-034136 20020212
- 主分类号: G01N21/55
- IPC分类号: G01N21/55 ; G01N21/41 ; G02B17/00 ; G02B26/08 ; H04J14/08
摘要:
A measuring apparatus is disclosed which includes a measuring unit equipped with a dielectric block and a thin film layer; an incidence system for making a light beam enter the dielectric block so that a condition for total internal reflection is satisfied at an interface between the dielectric block and the thin film layer; and a photodetector for receiving the light beam totally reflected at the interface. The measuring unit is measured a plurality of times, and a change in the state of attenuated total reflection during the plurality of measurements is detected. The sensor further includes a tilt measurement section for measuring the longitudinal tilt of the interface which changes the incidence angles during the plurality of measurements, and a calculating section for obtaining a measured value in which errors due to the longitudinal tilt have been corrected.
公开/授权文献
- US20020140938A1 Measuring apparatus 公开/授权日:2002-10-03
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