发明授权
US06885493B2 Method and a device for reducing hysteresis or imprinting in a movable micro-element
有权
用于减小可移动微元件中的滞后或压印的方法和装置
- 专利标题: Method and a device for reducing hysteresis or imprinting in a movable micro-element
- 专利标题(中): 用于减小可移动微元件中的滞后或压印的方法和装置
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申请号: US10467184申请日: 2002-01-28
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公开(公告)号: US06885493B2公开(公告)日: 2005-04-26
- 发明人: Ulric Ljungblad , Hubert Karl Lakner , Peter Dürr
- 申请人: Ulric Ljungblad , Hubert Karl Lakner , Peter Dürr
- 申请人地址: SE Taby
- 专利权人: Micronic Lasersystems AB
- 当前专利权人: Micronic Lasersystems AB
- 当前专利权人地址: SE Taby
- 代理机构: Haynes Beffel & Wolfeld LLP
- 代理商 Ernest J. Beffel, Jr.
- 优先权: SE0100336 20010205
- 国际申请: PCTSE02/00142 WO 20020128
- 国际公布: WO0206337 WO 20020815
- 主分类号: G02B26/08
- IPC分类号: G02B26/08 ; G02B26/00
摘要:
The present invention relates to a movable micro-element with reduced imprinting or hysteresis effect arranged spaced apart from a surface comprising at least one electrode. At least one restoring element is connected to said movable micro-element. An address electrode is arranged on said surface and capable to electrostatically attract said movable micro-element. Said address electrode is addressed to a first potential. Said movable micro-element is first set to a second potential defining a non addressed state and at a time period Δt before a predetermined pulsed signal is emitted said movable micro-element is switched from said second potential to a third potential defining an addressed state. Said movable micro-element is kept in said addressed state for a time period of Δt+Δt′. The invention also relates to a Spatial Light Modulator (SLM), an apparatus for patterning a workpiece and a method of reducing an imprinting or hysteresis effect of a movable micro-element.