发明授权
- 专利标题： Nondestructive characterization of thin films based on acquired spectrum
- 专利标题（中）： 基于获得光谱的薄膜的非破坏性表征
-
申请号： US10330317申请日： 2002-12-27
-
公开(公告)号： US06891158B2公开(公告)日： 2005-05-10
- 发明人: Paul E. Larson , David G. Watson
- 申请人： Paul E. Larson , David G. Watson
- 申请人地址： US CA Sunnyvale
- 专利权人： ReVera Incorporated
- 当前专利权人： ReVera Incorporated
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Blakely, Sokoloff, Taylor & Zafman
- 主分类号： G01B15/02
- IPC分类号： G01B15/02
摘要：
The present invention provides for characterization of a film (e.g., thickness determination for a silicon oxynitride film) using collected spectral data. For example, an acquired spectrum may be cumulatively integrated and the geometric properties of the integrated spectrum may be used to determine component concentration information. Thickness measurements for the film may be provided based on the component concentration information.
公开/授权文献
信息查询
