Invention Grant
- Patent Title: Fractional deionization process
- Patent Title (中): 分数去离子过程
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Application No.: US10325372Application Date: 2002-12-19
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Publication No.: US06896814B2Publication Date: 2005-05-24
- Inventor: Ravi Chidambaran , Devesh Sharma , Pavan Raina
- Applicant: Ravi Chidambaran , Devesh Sharma , Pavan Raina
- Applicant Address: US PA Canonsburg
- Assignee: Aquatech International Corporation
- Current Assignee: Aquatech International Corporation
- Current Assignee Address: US PA Canonsburg
- Agency: Buchanan Ingersoll PC
- Main IPC: B01D61/44
- IPC: B01D61/44 ; B01D61/48 ; B01D61/50 ; B01D61/52 ; B01J47/08 ; C02F1/00 ; C02F1/42 ; C02F1/46 ; C02F1/469 ; C02F1/68 ; C02F5/00 ; C02F11/00 ; C02F11/18

Abstract:
A liquid treatment process is described for sequential removal of ionic species of progressively decreasing ionic strength without precipitation or “scaling.” An aspect of the invention includes dual electrodeionization operations. The first electrodeionization operation is performed at a voltage calculated to remove strongly ionized species such as calcium and magnesium from the feed water without scaling. The product of the first electrodeionization operation is then subjected to a second electrodeionization operation. The second electrodeionization operation is performed at a voltage greater than the first electrodeionization operation, and is designed to remove more weakly ionized species such as silica and carbon dioxide, preventing scaling. More than two successive electrodeionization operations may be performed if desired. Multiple electrodeionization operations may occur in a single electrodeionization stack or in multiple electrodeionization stacks.
Public/Granted literature
- US20030201235A1 Fractional deionization process Public/Granted day:2003-10-30
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