发明授权
- 专利标题： Method for purification of tungsten hexafluoride
- 专利标题（中）： 纯化六氟化钨的方法
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申请号： US10149881申请日： 2000-12-14
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公开(公告)号： US06896866B2公开(公告)日： 2005-05-24
- 发明人: Hirohisa Kikuyama , Masahide Waki , Kazuyuki Fujimoto , Yoshinori Nakagawa
- 申请人： Hirohisa Kikuyama , Masahide Waki , Kazuyuki Fujimoto , Yoshinori Nakagawa
- 申请人地址： JP Osaka
- 专利权人： Stella Chemifa Kabushiki Kaisha
- 当前专利权人： Stella Chemifa Kabushiki Kaisha
- 当前专利权人地址： JP Osaka
- 代理商 Randall J. Knuth
- 优先权： JP11-358205 19991216
- 国际申请： PCTJP00/08849 WO 20001214
- 国际公布： WO0144112 WO 20010621
- 主分类号： C01G41/04
- IPC分类号： C01G41/04
摘要：
A method for purifying tungsten hexafluoride of high purity, capable of producing tungsten hexafluoride of higher purity than that of the related art, readily and at a low cost. A method for purifying tungsten hexafluoride of high purity, characterized in that tungsten hexafluoride containing molybdenum hexafluoride as an impurity, makes contact with a layer, in which a metal or an alloy is packed, containing at least one of molybdenum, tungsten, copper, nickel, iron, cobalt, zinc, titanium, aluminum, calcium, and magnesium at a temperature ranging from 0° C. to 100° C.
公开/授权文献
- US20030091498A1 Method for purification of tungsten hexafluoride 公开/授权日：2003-05-15
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