Invention Grant
- Patent Title: Method for manufacturing gallium nitride (GaN) based single crystalline substrate that include separating from a growth substrate
- Patent Title (中): 包括从生长衬底分离的基于氮化镓(GaN)的单晶衬底的方法
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Application No.: US10622466Application Date: 2003-07-21
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Publication No.: US06902989B2Publication Date: 2005-06-07
- Inventor: Jeong Seok Na , Seung Jin Yoo , Young Ho Park
- Applicant: Jeong Seok Na , Seung Jin Yoo , Young Ho Park
- Applicant Address: KR Kyungki-Do
- Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee: Samsung Electro-Mechanics Co., Ltd.
- Current Assignee Address: KR Kyungki-Do
- Agency: Lowe Hauptman & Berner, LLP
- Priority: KR10-2003-0037030 20030610
- Main IPC: C30B29/38
- IPC: C30B29/38 ; C23C16/34 ; C30B25/02 ; C30B33/00 ; H01L21/20

Abstract:
A method for manufacturing a gallium nitride (GaN)-based single crystalline substrate includes the steps of (a) forming a GaN-based single crystalline bulk on an upper surface of a growth substrate; (b) forming grooves through the growth substrate so that the growth substrate is patterned and divided into several units by the grooves, each of the grooves having a designated width; and (c) separating the GaN-based single crystalline bulk from the growth substrate by irradiating a laser beam on a lower surface of the growth substrate.
Public/Granted literature
- US20040253796A1 Method for manufacturing gallium nitride (GaN) based single crystalline substrate Public/Granted day:2004-12-16
Information query
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