发明授权
- 专利标题: Method and apparatus for dressing polishing cloth
- 专利标题(中): 抛光布修整方法和装置
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申请号: US10060366申请日: 2002-02-01
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公开(公告)号: US06905400B2公开(公告)日: 2005-06-14
- 发明人: Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
- 申请人: Norio Kimura , You Ishii , Toyomi Nishi , Takayoshi Kawamoto , Takeshi Sakurai
- 申请人地址: JP Tokyo
- 专利权人: Ebara Corporation
- 当前专利权人: Ebara Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP1996-184012 19960625
- 主分类号: B24B49/00
- IPC分类号: B24B49/00 ; B24B53/00 ; B24B1/00
摘要:
A polishing cloth mounted on a turntable is dressed by bringing a dresser in contact with the polishing cloth for restoring the polishing capability of the polishing cloth. The dressing is performed by measuring heights of a surface of the polishing cloth at radial positions of the polishing cloth in a radial direction thereof determining a rotational speed of the dresser with respect to a rotational speed of the turntable on the basis of the measured heights, and dressing the polishing cloth by pressing the dresser are rotating. The dresser has an annular diamond grain layer or an annular SiC layer.
公开/授权文献
- US20020072300A1 Method and apparatus for dressing polishing cloth 公开/授权日:2002-06-13
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