发明授权
- 专利标题: Lithographic projection apparatus with multiple suppression meshes
- 专利标题(中): 具有多个抑制网格的平版印刷设备
-
申请号: US10717929申请日: 2003-11-21
-
公开(公告)号: US06906788B2公开(公告)日: 2005-06-14
- 发明人: Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人: Levinus Pieter Bakker , Frank Jeroen Pieter Schuurmans
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 优先权: EP02079864 20021122
- 主分类号: G21K3/00
- IPC分类号: G21K3/00 ; G03F7/20 ; G21K5/00 ; G21K5/02 ; H01L21/027 ; H05G2/00 ; G03B27/72 ; G03B27/42 ; G03B27/52
摘要:
A lithographic projection apparatus is disclosed. The apparatus includes a radiation system to transmit a beam of radiation emitted from a radiation source, and a support structure constructed to hold a patterning structure to be irradiated by the beam. A substrate holder is constructed to hold a substrate, and a projection system is constructed and arranged to project an irradiated portion of the patterning structure onto a target portion of the substrate. A first screen is positioned in a path of the beam between the radiation system and an optical element and a positive voltage is applied to the first screen to repel positively charged particles away from the optical element. A second screen is positioned in the path of the beam on at least one side of the first screen, and a negative voltage is applied to the second screen to repel negative particles away from the first screen.