发明授权
US06906790B2 Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography 失效
光栅操纵器和相关方法用于输送薄带圆形光罩,用于带电粒子束微光刻

Reticle manipulators and related methods for conveying thin, circular reticles as used in charged-particle-beam microlithography
摘要:
Robotic reticle manipulators are disclosed for use in holding and conveying, with good stability, thin, circular reticles as used in charged-particle-beam microlithography. A manipulator embodiment includes at least one arm configured for executing movements in the X-, Y-, and Z-directions. Connected distally to the at least one arm is a U-shaped fork (as an exemplary reticle-support member) defining recessed surfaces and vacuum ports for holding the reticle at the reticle's narrow handling zone located along the periphery of the reticle. Each vacuum port includes an upwardly extending lip that defines, on its “upward”-facing surface, a respective reticle-contact surface. Three such vacuum ports are provided on the fork and are nearly equidistantly separated from one another. Thus, as the reticle is being held and conveyed by the manipulator, the reticle is securely held to prevent reticle damage.
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