发明授权
- 专利标题: Apparatus and method for measuring each thickness of a multilayer stacked on a substrate
- 专利标题(中): 用于测量层叠在基板上的多层厚度的装置和方法
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申请号: US10914149申请日: 2004-08-10
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公开(公告)号: US06912056B2公开(公告)日: 2005-06-28
- 发明人: Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
- 申请人: Pil-Sik Hyun , Sun-Jin Kang , Sang-Kil Lee , Kyung-Ho Jung
- 申请人地址: KR Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Gyeonggi-do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR10-2003-0056961 20030818
- 主分类号: G01B11/06
- IPC分类号: G01B11/06 ; H01L21/66 ; G01B11/28
摘要:
In an apparatus and a method of measuring a thickness of a multilayer on a substrate, a spectrum of reflected light reflected from the substrate is measured. A plurality of recipe data, each corresponding to one of a plurality of hypothetical multilayers, is stored. One of the plurality of hypothetical multilayers is initially assumed to be the multilayer actually formed on the substrate. A plurality of theoretical spectra is calculated using one of the plurality of recipe data in accordance with various theoretical thicknesses of one of the plurality of hypothetical multilayers. The measured spectrum is compared with the plurality of theoretical spectra to determine a temporary thickness of the multilayer. A reliability of the temporary thickness of the multilayer is estimated. The temporary thickness is output as a thickness of the multilayer on the substrate when the reliability of the temporary thickness is within an allowable range.
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