发明授权
- 专利标题： Revolution member supporting apparatus and semiconductor substrate processing apparatus
- 专利标题（中）： 革命会员支持装置和半导体基板处理装置
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申请号： US09842650申请日： 2001-04-27
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公开(公告)号： US06921466B2公开(公告)日： 2005-07-26
- 发明人: Akihisa Hongo , Ichiro Katakabe , Shinya Morisawa
- 申请人： Akihisa Hongo , Ichiro Katakabe , Shinya Morisawa
- 申请人地址： JP Tokyo
- 专利权人： Ebara Corporation
- 当前专利权人： Ebara Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Wenderoth, Lind & Ponack, L.L.P.
- 优先权： JP2000-127365 20000427
- 主分类号： B24B37/34
- IPC分类号： B24B37/34 ; H01L21/00 ; H01L21/687 ; C25D5/02 ; H01L21/288
摘要：
A revolution member supporting apparatus holds and rotates a disc-shaped object (object to be rotated) such as a semiconductor wafer. The revolution member supporting apparatus includes a rotatable member which rotates about an axis of roation, and a plurality of holding members which are disposed along a circle having a center corresponding to the axis of rotation of the rotatable member, and which revolve around the axis of rotation when the rotatable member rotates, wherein the holding members are allowed to swing about their own central axes.
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