发明授权
- 专利标题： Bottom anti-reflective coat forming composition for lithography
- 专利标题（中）： 用于光刻的底部防反射涂层组合物
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申请号： US10078108申请日： 2002-02-20
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公开(公告)号： US06927266B2公开(公告)日： 2005-08-09
- 发明人: Shinya Arase , Takahiro Kishioka , Ken-ichi Mizusawa
- 申请人： Shinya Arase , Takahiro Kishioka , Ken-ichi Mizusawa
- 申请人地址： JP Tokyo
- 专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人： Nissan Chemical Industries, Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge, PLC
- 优先权： JP2001-046779 20010222
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/038 ; G03F7/09 ; C08F122/40
摘要：
The present invention relates to a bottom anti-reflective coat forming composition having the resin with the structural unit comprising maleimide or maleimide derivative for the lithography process in the preparation of semiconductor device. The resin comprises maleimide or derivative thereof in the principal chain or the side chain and its weight-average molecular weight is 700-1000000. The invention offers the bottom anti-reflective coating for lithography showing high anti-reflective effect, no intermixing with resist layer, excellent resist pattern, and large dry etching rate in comparison to resist.
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