发明授权
- 专利标题: Exposure head
- 专利标题(中): 曝光头
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申请号: US10443995申请日: 2003-05-23
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公开(公告)号: US06928198B2公开(公告)日: 2005-08-09
- 发明人: Hiromi Ishikawa , Yoji Okazaki , Kazuhiko Nagano
- 申请人: Hiromi Ishikawa , Yoji Okazaki , Kazuhiko Nagano
- 申请人地址: JP Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JP Kanagawa
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2002-149879 20020523
- 主分类号: G02B26/08
- IPC分类号: G02B26/08 ; G03F7/20 ; G02F1/295
摘要:
The present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a digital micromirror device (DMD) is placed satisfies the following formula: D W ≤ α × M 2 × t - K × λ a θ .
公开/授权文献
- US20030219189A1 Exposure head 公开/授权日:2003-11-27
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