发明授权
US06928198B2 Exposure head 失效
曝光头

Exposure head
摘要:
The present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a digital micromirror device (DMD) is placed satisfies the following formula: D W ≤ α × M 2 × t - K × λ a θ .