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    Optical wiring substrate fabrication process and optical wiring substrate device
    1.
    发明授权
    Optical wiring substrate fabrication process and optical wiring substrate device 有权
    光布线基板制造工艺和光布线基板装置

    公开(公告)号：US07197201B2

    公开(公告)日：2007-03-27

    申请号：US10456965

    申请日：2003-06-09

    申请人： Daisuke Nakaya ,  Takeshi Fujii ,  Yoji Okazaki ,  Kazuhiko Nagano ,  Hiromi Ishikawa

    发明人： Daisuke Nakaya ,  Takeshi Fujii ,  Yoji Okazaki ,  Kazuhiko Nagano ,  Hiromi Ishikawa

    IPC分类号： G02B6/12

    CPC分类号： G03F7/7005 ,  G02B6/136 ,  G02B6/138 ,  G02B2006/12104 ,  G03F7/70291 ,  G03F7/70391

    摘要： An optical wiring substrate fabrication method capable of simple formation, by maskless exposure, of an inclined face shape at an end portion of a core layer structuring an optical waveguide. Using an exposure apparatus, image exposure is carried out with a light beam which is modulated by a spatial modulation element in accordance with image information. A predetermined area of a photosensitive material (a photoresist), which is coated on the core layer which is a material of the optical wiring substrate, is exposed by a light beam (UV) and patterned to form an etching mask. A region corresponding to the inclined face, which is to be formed at the end portion of the core layer, is exposed and patterned by the light beam, exposure amounts of which are controlled in accordance with the inclined form of the inclined face, such that an end portion of the etching mask has an inclined face structure. When the core layer is worked by etching using this etching mask, working of the core layer at the end portion of the core layer progresses in proportion to film thickness of the etching mask, and the inclined face is formed.

    摘要翻译： 一种光学布线基板的制造方法，其能够通过无掩模地曝光在构成光波导的芯层的端部处形成倾斜的表面形状。 使用曝光装置，利用由空间调制元件根据图像信息调制的光束进行图像曝光。 通过光束（UV）对作为光布线基板的材料的芯层上涂布的感光材料（光致抗蚀剂）的预定区域进行曝光并图案化以形成蚀刻掩模。 对应于要形成在芯层的端部的倾斜面的区域被光束曝光和图案化，其曝光量根据倾斜面的倾斜形式被控制，使得 蚀刻掩模的端部具有倾斜面结构。 当通过使用该蚀刻掩模的蚀刻加工芯层时，芯层的端部的芯层的加工与蚀刻掩模的膜厚度成比例地进行，并且形成倾斜面。

    Exposure head, exposure apparatus, and application thereof
    5.
    发明申请
    Exposure head, exposure apparatus, and application thereof 失效
    曝光头，曝光装置及其应用

    公开(公告)号：US20050180692A1

    公开(公告)日：2005-08-18

    申请号：US11104561

    申请日：2005-04-13

    申请人： Hiromi Ishikawa ,  Kazuhiko Nagano ,  Yoji Okazaki ,  Takeshi Fujii ,  Hiromitsu Yamakawa

    发明人： Hiromi Ishikawa ,  Kazuhiko Nagano ,  Yoji Okazaki ,  Takeshi Fujii ,  Hiromitsu Yamakawa

    IPC分类号： B23K26/06 ,  B29C67/00 ,  B41J2/447 ,  B41J2/465 ,  B41J2/47 ,  D06L3/04 ,  D06M10/00 ,  G02B26/08 ,  G03F7/20 ,  H04N1/12 ,  H04N1/191 ,  G02B6/34

    CPC分类号： B41J2/451 ,  B23K26/0604 ,  B23K26/066 ,  B29C64/135 ,  B29C64/153 ,  B33Y30/00 ,  B41J2/45 ,  B41J2/465 ,  B41J2/47 ,  D06L4/50 ,  D06M10/005 ,  G02B26/0841 ,  G03F7/7005 ,  G03F7/70291 ,  H04N1/12 ,  H04N1/191 ,  H04N1/1916

    摘要： In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost. Since the number of optical fibers is few, the light-emitting region is further decreased when the optical fibers are arrayed.

    摘要翻译： 在本发明的曝光装置中，对于空间光调制器，利用根据曝光信息生成的控制信号来控制少于像素部分总数的多个像素部分中的每一个。 即，在不控制基板上的整个像素部分的情况下，控制像素部分的一部分。 因此，像素部分中的像素数量减少，并且控制信号的传送时间变短。 这使得能够增加激光束的调制速度并执行高速曝光。 其中激光束并入并撞击在光纤上的并入的激光光源优于激光装置。 通过采用所结合的激光光源，可以获得高亮度和高输出，并且优选空间光调制器的曝光。 由于光纤阵列获得的光纤很少，所以成本低。 由于光纤的数量少，所以在配置光纤时，发光区域进一步降低。

    Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method
    6.
    发明授权
    Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method 有权
    激光装置，曝光头，曝光装置和光纤连接方法

    公开(公告)号：US07121740B2

    公开(公告)日：2006-10-17

    申请号：US11195840

    申请日：2005-08-03

    申请人： Yoji Okazaki ,  Hiromi Ishikawa ,  Kazuhiko Nagano ,  Takeshi Fujii ,  Hiromatsu Yamakawa

    发明人： Yoji Okazaki ,  Hiromi Ishikawa ,  Kazuhiko Nagano ,  Takeshi Fujii ,  Hiromatsu Yamakawa

    IPC分类号： G02B6/36

    CPC分类号： G02B6/4249 ,  G02B6/04 ,  G02B6/08 ,  G02B6/2551 ,  G02B6/4206 ,  G02B6/425 ,  H01S3/06708 ,  H01S3/06745

    摘要： An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.

    摘要翻译： 束状纤维光源的光纤是芯直径均匀但发射端包层直径比其入射端包层直径小的光纤，其发光区域变小。 来自通过透镜系统并入射到DMD上的该较高亮度束状光纤光源的光通量的角度较小，即使照明NA更小。 因此，入射在要曝光的表面上的通量角较小。 也就是说，可以在不增加图像形成NA的情况下获得微小的图像形成光束，焦点深度被延长。

    Exposure head and exposure apparatus
    8.
    发明授权
    Exposure head and exposure apparatus 有权
    曝光头和曝光装置

    公开(公告)号：US07068414B2

    公开(公告)日：2006-06-27

    申请号：US10456968

    申请日：2003-06-09

    申请人： Hiroshi Sunagawa ,  Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano ,  Takeshi Fujii ,  Toshihiko Omori

    发明人： Hiroshi Sunagawa ,  Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano ,  Takeshi Fujii ,  Toshihiko Omori

    IPC分类号： G02B26/00

    CPC分类号： G03F7/7005 ,  G02B26/0841 ,  G03F7/70275 ,  G03F7/70291

    摘要： A reduction in utilization efficiency of laser beams emitted from laser emission portions of illumination means is limited and an exposure surface is exposed by beam spots with desired spot diameters and spot forms. At an exposure head, first microlenses are arranged in a two dimensional manner so as to correspond to micromirrors at a DMD, and apertures are arranged in a two dimensional manner at back side focusing positions of the first microlenses. With this exposure head, light source images, which are formed to be very small at back side focusing positions of the first microlenses by the first microlenses, are projected onto the exposure surface, and these light source images serve as beam spots BS and expose the exposure surface.

    摘要翻译： 从照明装置的激光发射部分发射的激光束的利用效率的降低受到限制，并且通过具有所需光点直径和斑点形式的光束点曝光曝光表面。 在曝光头处，第一微透镜以二维方式排列，以便对应于DMD处的微反射镜，并且孔以二维方式排列在第一微透镜的后侧聚焦位置。 利用该曝光头，通过第一微透镜在第一微透镜的后侧聚焦位置处形成为非常小的光源图像被投影到曝光表面上，并且这些光源图像用作光束点BS并暴露 曝光面。

    Exposure head
    9.
    发明申请
    Exposure head 失效
    曝光头

    公开(公告)号：US20050200693A1

    公开(公告)日：2005-09-15

    申请号：US11124058

    申请日：2005-05-09

    申请人： Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano

    发明人： Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano

    IPC分类号： G02B26/08 ,  G03F7/20 ,  B41J2/47

    CPC分类号： G03F7/70291 ,  G02B26/0841 ,  G03F7/7005

    摘要： In the present invention provides, in order to obtain a desired focal depth t in a range a of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1 (NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter

    摘要翻译： 在本发明中，为了在可接受的光束直径增加的范围a中获得期望的焦点深度t，设计曝光头，使得输出光束宽度D的比D / W与光束宽度 放置DMD的位置的W满足以下关系式。 D W 2 - /> > 在上述公式中，参数定义如下。 λ：激光的波长θ：从根据下式的光纤的数值孔径（NA）导出的照明光源输出的光束的角度θ= sin（-1） NA）D：从照明光源W输出的光束的宽度W：放置DMD的位置处的光束宽度（照射面）a：DMD上的一个像素的大小K：由光束确定的系数 特征，K = 1 M：成像光学系统的放大倍率t：所需焦点深度α：可接受的光束直径增加量

      Exposure head
      10.
      发明授权
      Exposure head 失效
      曝光头

      公开(公告)号：US07061517B2

      公开(公告)日：2006-06-13

      申请号：US11124058

      申请日：2005-05-09

      申请人： Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano

      发明人： Hiromi Ishikawa ,  Yoji Okazaki ,  Kazuhiko Nagano

      IPC分类号： B41J2/47 ,  G02F1/295

      CPC分类号： G03F7/70291 ,  G02B26/0841 ,  G03F7/7005

      摘要： In the present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1(NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter

      摘要翻译： 在本发明中，为了获得可接受的增加光束直径的α的范围内的所需焦点深度t，曝光头被设计成使得输出光束宽度D的比D / W与光束宽度 放置DMD的位置的W满足以下关系式。 D W 2 - /> > 在上述公式中，参数定义如下。 λ：激光的波长θ：根据以下公式由光纤的数值孔径（NA）导出的照明光源输出的光束的角度<？in-line-formula description =“In-line 公式“end =”lead“？> theta = sin （NA）<？in-line-formula description =”In-line Formulas“end =”tail“？> D： 从照明光源W输出的光束：DMD放置位置处的光束宽度（照射面）a：DMD上的一个像素的大小K：由光束特性确定的系数，K = 1M ：成像光学系统的放大倍数t：所需的焦深α：可接受的增加光束直径的数量