发明授权
- 专利标题: Filter medium for air filter and process for producing the same
- 专利标题(中): 用于空气过滤器的过滤介质及其制造方法
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申请号: US09601390申请日: 1998-12-22
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公开(公告)号: US06929672B1公开(公告)日: 2005-08-16
- 发明人: Yoshihide Wakayama , Sadao Kobayashi , Satoki Sugiyama , Seiichi Takizawa , Takeshi Yamada , Keiji Matsuno
- 申请人: Yoshihide Wakayama , Sadao Kobayashi , Satoki Sugiyama , Seiichi Takizawa , Takeshi Yamada , Keiji Matsuno
- 申请人地址: JP JP JP
- 专利权人: Taisei Corporation,Kondoh Industries, Ltd.,Cambridge Filter Japan, Ltd.
- 当前专利权人: Taisei Corporation,Kondoh Industries, Ltd.,Cambridge Filter Japan, Ltd.
- 当前专利权人地址: JP JP JP
- 代理机构: Young & Basile, P.C.
- 国际申请: PCT/JP98/05807 WO 19981222
- 国际公布: WO00/37160 WO 20000629
- 主分类号: B01D39/16
- IPC分类号: B01D39/16 ; D21H27/08 ; B01D39/04
摘要:
The present invention has as its object to provide an air filter not only for trapping suspended particulate substances but also for not generating hazardous contaminates in the air, which cause trouble in the manufacture of semiconductor devices. As a binder to bind fibers of the air filter together, a polymer dispersion is used in which a copolymer of a hydrophilic monomer and a hydrophobic monomer is dispersed in water. As an initiator for polymerization of the copolymer, an organic peroxide is used. When an air filter (8) is installed downstream of a chemical filter (7), the space (4) placed downstream of the air filter (8) is made substantially free of organic substances and/or inorganic substances that cause trouble in the manufacture of semiconductor devices.
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