发明授权
- 专利标题： Multiple exposure method
- 专利标题（中）： 多重曝光法
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申请号： US09337040申请日： 1999-06-28
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公开(公告)号： US06930754B1公开(公告)日： 2005-08-16
- 发明人: Mitsuro Sugita , Miyoko Kawashima
- 申请人： Mitsuro Sugita , Miyoko Kawashima
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP10-184235 19980630; JP10-184239 19980630; JP10-184240 19980630; JP10-201343 19980630
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03B27/42 ; G03B27/52
摘要：
An exposure apparatus includes a first exposure device for illuminating a predetermined mask with light of a predetermined wavelength under a first illumination condition, to print a first pattern on a predetermined exposure region, and a second exposure device for illuminating the mask with light of the predetermined wavelength under a second illumination condition, different from the first illumination condition, to print a second pattern on the predetermined exposure region, in which the mask has a desired pattern and an auxiliary pattern having a shape different from that of the desired pattern, and a first exposure by the first exposure device and a second exposure by the second exposure device are carried out prior to a development process.
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