Invention Grant
- Patent Title: Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer
- Patent Title (中): 多点光斑轮廓仪，椭偏仪，反射计和散射仪
-
Application No.: US10126154Application Date: 2002-04-19
-
Publication No.: US06930765B2Publication Date: 2005-08-16
- Inventor: Steven W. Meeks , Hung P. Nguyen
- Applicant: Steven W. Meeks , Hung P. Nguyen
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies
- Current Assignee: KLA-Tencor Technologies
- Current Assignee Address: US CA Milpitas
- Agency: Fenwick & West LLP
- Main IPC: G01B11/06
- IPC: G01B11/06 ; H01L21/66 ; G01N21/88
Abstract:
A combined optical profiler, ellipsometer, reflectometer and scatterometer is described which is configured to have user selectable spot sizes. An attached computer allows the user to select via software the desired spot size on the substrate.
Public/Granted literature
- US20020163634A1 Multiple spot size optical profilometer, ellipsometer, reflectometer and scatterometer Public/Granted day:2002-11-07
Information query
